Atomic Model and Optimization of EUV Light Source
نویسندگان
چکیده
منابع مشابه
Radiation-Hydrodynamics, Spectral, and Atomic Physics Modeling of Laser-Produced Plasma EUV Lithography Light Sources
Tin, lithium, and xenon laser-produced plasmas are attractive candidates as light sources for extreme ultraviolet lithography (EUVL). Simulation of the dynamics and spectral properties of plasmas created in EUVL experiments plays a crucial role in analyzing and interpreting experimental measurements, and in optimizing the 13.5 nm radiation from the plasma source. Developing a good understanding...
متن کاملImaging Diagnostics of Debris from Double Pulse Laser-Produced Tin Plasma for EUV Light Source
The dynamics of debris from laser produced Tin (Sn) plasma was investigated for EUV light source. The kinetic behaviors of the Sn atoms and of the dense particles from Sn droplet target irradiated by double pulses from the Nd:YAG laser and the CO2 laser were also investigated by the laser-induced fluorescence imaging method and a high-speed imaging, respectively. After the pre-pulse irradiation...
متن کاملthe innovation of a statistical model to estimate dependable rainfall (dr) and develop it for determination and classification of drought and wet years of iran
آب حاصل از بارش منبع تأمین نیازهای بی شمار جانداران به ویژه انسان است و هرگونه کاهش در کم و کیف آن مستقیماً حیات موجودات زنده را تحت تأثیر منفی قرار می دهد. نوسان سال به سال بارش از ویژگی های اساسی و بسیار مهم بارش های سالانه ایران محسوب می شود که آثار زیان بار آن در تمام عرصه های اقتصادی، اجتماعی و حتی سیاسی- امنیتی به نحوی منعکس می شود. چون میزان آب ناشی از بارش یکی از مولفه های اصلی برنامه ...
15 صفحه اولCO2 Laser Produced Tin Plasma Light Source as the Solution for EUV Lithography
High average power EUV light source has been the “most critical” issue in the research and development of the EUV lithography system in one decade. EUV LLC and International Sematech significantly stimulated the global research community to work seriously to advance plasma technology in achieving the goal of the EUV source, required by the semiconductor industry. It is instructive to look into ...
متن کاملModeling and optimization of mass-limited targets for EUV Lithography
Current challenges in the development of efficient laser produced plasma (LPP) sources for EUV lithography are increasing EUV power at IF and maximizing lifetime and therefore, reducing cost of devices. Mass-limited targets such as small tin droplets are considered among the best choices for cleaner operation of the optical system because of lower mass of atomic debris produced by the laser bea...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: The Review of Laser Engineering
سال: 2008
ISSN: 0387-0200,1349-6603
DOI: 10.2184/lsj.36.690